欢迎浏览朗思自控科技有限公司官方网站!!
Industry Information
LAM Research 715-042721-810 Symmetrical High Flow Liner
联系人:李经理
电话:15685359870
手机:15685359870
QQ:3165088973
邮箱:3165088973@qq.com
地址: 中国

 
产品详情


LAM Research 715-042721-810 Symmetrical High Flow Liner


LAM Research 715-042721-810 is a symmetrical high flow chamber liner designed for LAM Versys Kiyo45 and 2300 series semiconductor etching equipment. It serves as a critical inner chamber component that shields the vacuum chamber wall and optimizes gas flow distribution during wafer plasma etching processes.


This liner adopts precision machined aluminum with special surface coating to resist plasma corrosion and particle generation. Its symmetrical slot structure ensures uniform gas distribution across the wafer surface. Widely supplied as replacement consumable spare parts for 8/12-inch wafer fabrication semiconductor fabs.


Main Specifications

  • Brand: LAM Research
  • Part Number: 715-042721-810
  • Product Type: Symmetrical High Flow Chamber Liner
  • Applicable Equipment: Versys Kiyo45, 2300 Series Etch System
  • Material: Machined aluminum with anti-plasma surface treatment
  • Structure: Symmetrical slotted design for optimized gas flow
  • Application: Vacuum process chamber inner shielding component
  • Weight: Approximately 2.67 kg
  • Working Environment: High vacuum, plasma etching chamber
  • Operating Temperature Range: Up to 150°C

Core Functions

  • Protect the vacuum chamber wall from plasma bombardment and chemical erosion
  • Form uniform gas flow field to improve wafer etching uniformity and process stability
  • Control by-products deposition and reduce particle pollution inside the reaction chamber
  • Symmetrical layout eliminates airflow deviation to ensure consistent wafer processing results
  • Easy disassembly design for regular cleaning, maintenance and periodic replacement
  • Special coating minimizes reaction with process gas to extend service cycle
  • Precision dimensional tolerance guarantees perfect fit inside the etching chamber
  • Reduce equipment downtime by separating consumable liner from expensive main chamber
  • Meet strict semiconductor cleanroom standards for low particle generation performance
  • Support stable mass production of advanced wafer etching manufacturing processes

Application Scenarios

  • 8-inch and 12-inch semiconductor wafer fabrication etching process equipment
  • LAM Versys Kiyo45 and 2300 series plasma etcher reaction chambers
  • Foundry fabs, memory chip manufacturing production lines
  • Semiconductor research laboratory process platform maintenance projects
  • Display panel and power semiconductor wafer etching equipment
  • Fab equipment preventive maintenance and regular consumable replacement
  • Used semiconductor etching equipment refurbishment and upgrade projects
  • Semiconductor equipment spare parts inventory management for wafer manufacturers
  • Electronics manufacturing industry advanced process equipment maintenance projects
  • LAM semiconductor chamber consumable spare parts trading and supply projects